1051288

DIN 50453-2 [ Withdrawn ]

Testing of materials for semiconductor technology; determination of etch rates of etching mixtures; silicium-dioxid coating; optical method

standard by Deutsches Institut Fur Normung E.V. (German National Standard) , 10/01/1990

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Product Details

Published:
10/01/1990
Number of Pages:
2
File Size:
1 file , 120 KB
Product Code(s):
2524674, 2380725, 2380725, 2524674
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This product is unavailable in Ukraine, Russia, Belarus
 

Document History

  1. DIN 50453-2


    Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicon-dioxide coating, optical method

    • Most Recent

  2. DIN 50453-2 - DRAFT


    Draft Document - Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicium-dioxid coating, optical method

    • Historical Version

  3. DIN 50453-2

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    Testing of materials for semiconductor technology; determination of etch rates of etching mixtures; silicium-dioxid coating; optical method

    • Historical Version