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About This Item

 

Full Description

This document describes a glow-discharge optical-emission spectrometric method for the determination of the thickness, mass per unit area and chemical composition of metal oxide films.

This method is applicable to oxide films 1 nm to 10 000 nm thick on metals. The metallic elements of the oxide can include one or more from Fe, Cr, Ni, Cu, Ti, Si, Mo, Zn, Mg, Mn, Zr and Al. Other elements that can be determined by the method are O, C, N, H, P and S.

Cross References:
ISO 14707
ISO 14284
ISO 16962:2017
ISO 5725-2
ISO 5725-1
ISO 5725-6
ISO 9000:2015
ISO/IEC 17025:2017


All current amendments available at time of purchase are included with the purchase of this document.
 

Document History

  1. BS PD ISO/TS 25138:2019

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    Surface chemical analysis. Analysis of metal oxide films by glow-discharge optical-emission spectrometry

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  2. BS DD ISO/TS 25138:2010


    Surface chemical analysis. Analysis of metal oxide films by glow-discharge optical-emission spectrometry

    • Historical Version