Language:
    • Available Formats
    • Options
    • Availability
    • Priced From ( in USD )
    • Secure PDF 🔒
    • 👥
    • Immediate download
    • $48.12
    • Add to Cart
    • Printed Edition
    • Ships in 1-2 business days
    • $53.41
    • Add to Cart
    • Printed Edition + PDF
    • Immediate download
    • $67.36
    • Add to Cart

Customers Who Bought This Also Bought

 

About This Item

 

Full Description

Adopts ISO 17560:2002 to specify a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon and using stylus profilometry or optical interferometry for depth scale calibration.