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About This Item

 

Full Description

BS ISO 22197-1:2016 specifies a test method for the determination of the air-purification performance of materials that contain a photocatalyst or have photocatalytic films on the surface, usually made from semiconducting metal oxides, such as titanium dioxide or other ceramic materials, by continuous exposure of a test piece to the model air pollutant under illumination with ultraviolet light. This document is intended for use with different kinds of materials, such as construction materials in flat sheet, board or plate shape, that are the basic forms of materials for various applications. This document also applies to materials in honeycomb-form and to plastic or paper materials if they contain ceramic microcrystals and composites. This document does not apply to powder or granular photocatalytic materials.

This test method is usually applicable to photocatalytic materials produced for air purification. This method is not suitable for the determination of other performance attributes of photocatalytic materials, i.e. decomposition of water contaminants, self-cleaning, antifogging and antibacterial actions. It concerns the removal of nitric oxide.


Cross References:
ISO 4892-1
ISO 4892-3
ISO 5725-2
ISO 6145-7
ISO 7996
ISO 10304-1
ISO 10523
ISO 80000-1
ISO/IEC 17025


All current amendments available at time of purchase are included with the purchase of this document.
 

Document History

  1. BS ISO 22197-1:2016

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    Fine ceramics (advanced ceramics, advanced technical ceramics). Test method for air-purification performance of semiconducting photocatalytic materials-Removal of nitric oxide

    • Most Recent
  2. BS ISO 22197-1:2007


    Fine ceramics (advanced ceramics, advanced technical ceramics). Test method for air-purification performance of semiconducting photocatalytic materials-Removal of nitric oxide

    • Historical Version
  3. BS 06/30156520 DC


    BS ISO 22197-1. Fine ceramics (advanced ceramics, advanced technical ceramics). Test method for air-purification performance of semiconducting photocatalytic materials. Removal of nitric oxide

    • Historical Version