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Full Description

This Technical Report gives guidelines for measuring the sputtered depth in sputtered depth profiling. The methods of sputtered depth measurement described in this Technical Report are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres.

 

Document History

  1. ISO/TR 15969:2021


    Surface chemical analysis - Depth profiling - Measurement of sputtered depth

    • Most Recent
  2. ISO/TR 15969:2001

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    Surface chemical analysis - Depth profiling - Measurement of sputtered depth

    • Historical Version